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ZnO:Al薄膜性质研究
引用本文:杨春容,袁正希,薛书文,邓宏. ZnO:Al薄膜性质研究[J]. 湛江师范学院学报, 2006, 27(6): 37-40
作者姓名:杨春容  袁正希  薛书文  邓宏
作者单位:1. 电子科技大学,微电子与固体电子学院,四川,成都,610054
2. 电子薄膜与集成器件国家重点实验室,四川,成都,610054
3. 电子科技大学,物理电子学院,四川,成都,610054
4. 电子科技大学,微电子与固体电子学院,四川,成都,610054;电子薄膜与集成器件国家重点实验室,四川,成都,610054
基金项目:国家自然科学基金;国防科技预研项目
摘    要:采用溶胶-凝胶法在硅(100)和玻璃衬底上制备了掺铝氧化锌(ZnO:Al)薄膜.当掺Al3 浓度小于或等于15%时,得到的薄膜均为单一c轴取向.c轴晶格常数随掺Al3 浓度的增加逐渐减小,当掺Al3 浓度增至15%时,薄膜c轴晶格常数值减小约0.56%.薄膜的光学带隙随掺Al3 浓度的增加而增大,掺Al3 20%的薄膜光学带隙达到3.99 eV.O1s结合能随掺Al3 浓度的增加而增大.

关 键 词:掺铝氧化锌薄膜  c轴取向  光学带隙  结合能
文章编号:1006-4702(2006)06-0037-04
收稿时间:2006-10-29
修稿时间:2006-10-29

A Study on the Properties of ZnO:Al thin films
YANG Chun-rong,YUAN Zheng-xi,XUE Shu-wen,DENG Hong. A Study on the Properties of ZnO:Al thin films[J]. Journal of Zhanjiang Normal College, 2006, 27(6): 37-40
Authors:YANG Chun-rong  YUAN Zheng-xi  XUE Shu-wen  DENG Hong
Abstract:ZnO:Al thin films were deposited onto silicon(100) and glass substrates by sol-gel process.The Al-doped ZnO thin films with doping level below 15% showed only c-axis orientation.The c axis constant decreased with increasing Al content,and the c-axis constant of ZnO:Al thin films with Al content of 15% decreased by about 0.56% compared with that of ZnO crystal.The optical band-gap showed evidently blueshift with increasing the Al3 concentration.For the sample doped with 20% Al3 content,the optical band-gap energy reached 3.99 eV.The binding energy of O1s increased with increasing Al content.
Keywords:Al-doped zinc oxide thin films  c-axis orientation  optical band-gap energy  binding energy
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